Products Cited in Publications Worldwide Sequence-Defined Peptoid Block Copolymers for Chemically Amplified Resists

Sequence-Defined Peptoid Block Copolymers for Chemically Amplified Resists

Henein, Carolyn

DOI:

Abstract

The semiconductor industry is growing at a rapid rate. As Moore's Law drives the demand for smaller and more efficient microelectronic devices, the need for advanced lithographic techniques and materials becomes paramount. In order to meet this demand, lithography has advanced from using deep ultraviolet (DUV) to extreme ultraviolet (EUV) light for patterning chemically amplified resists (CARs). Yet, overcoming nanoscale heterogeneities due to material stochastics remains a limiting factor in achieving high precision patterning. Sequence-defined, bio-inspired polymers, such as polypeptoids, can be employed to address the stochastic limitations inherent to synthetic polymers. This work explores polypeptoids as a materials platform for understanding the effects of sequence on patterning. Seven 10-mer polypeptoid sequences with varying architectures and terminal groups were synthesized and purified. The materials were characterized using analytical high performance liquid chromatography–mass spectrometry (HPLC–MS), differential scanning calorimeter (DSC), and UV-Vis spectrophotometry. Preliminary patterning results provide insight on the impact of monomer species and sequence on feature sizes, thereby demonstrating the potential of these materials in the semiconductor industry.

Purchased from AmBeed

H-β-Ala-OtBu·HCl

A15977658620-93-297%

H-β-Ala-OtBu·HCl

16.0/10g

Detail