Photoresists are sophisticated functional systems comprising photoactive polymers, photosensitizers, photoacid generators, photoinitiators, and bottom anti-reflective coatings. Photopolymer monomers are materials that undergo chemical structural changes under specific wavelength irradiation. The molecular design typically incorporates photoactive groups (e.g., acrylates, azides, epoxides), enabling selective solubility changes through photochemical reactions (crosslinking, degradation, or polarity switching) to form microscale or nanoscale patterns after development. Negative photoresists contain photocrosslinkable groups that polymerize or crosslink upon exposure to form insoluble networks. Positive photoresists incorporate photodegradable groups that cleave into soluble products after exposure.
A420314161182-73-693% (stabilized with MEHQ)
(((9H-Fluorene-9,9-diyl)bis(4,1-phenylene))bis(oxy))bis(ethane-2,1-diyl) diacrylate$152.00/25g Detail
A3298285888-33-595% (stabilized with MEHQ)
(1R,2R,4R)-rel-1,7,7-Trimethylbicyclo[2.2.1]heptan-2-yl acrylate$11.00/25g Detail
A1632257534-94-395% stabilized 150-200 ppm MEHQ
Isobornyl methacrylate$30.00/500g Detail
A221874105-16-897% (stabilized with MEHQ)
2-(Diethylamino)ethyl methacrylate$21.00/100g Detail
A831326352-87-498% GC(stabilized with MEHQ)
2,2,2-Trifluoroethyl methacrylate$40.00/100g Detail
A661209161841-12-997%
6-(4-Hydroxyphenoxy)hexyl acrylate$39.00/25g Detail
A103429585-07-998% (stabilized with MEHQ)
tert-Butyl methacrylate$11.00/25g Detail
A414090688-84-699% (stabilized with MEHQ)
2-Ethylhexyl methacrylate$52.00/1kg Detail